Regulations last checked for updates: Feb 21, 2025

Title 40 - Protection of Environment last revised: Nov 21, 2025
Appendix - Table I-11 to Subpart I of Part 98—Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for Use With the Stack Test Method

Table I-11 to Subpart I of Part 98—Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for Use With the Stack Test Method

[150 mm and 200 mm Wafers]

All processes Process gas i
CF4 C2F6 CHF3 CH2F2 C2HF5 CH3F C3F8 C4F8 NF3 NF3
Remote
SF6 C4F6 C5F8 C4F8O
1-Ui0.790.550.510.130.0640.700.400.120.180.0280.580.0830.0720.14
BCF4NA0.190.0850.0790.077NA0.200.110.110.0150.130.095NA0.13
BC2F60.027NA0.0350.0250.0240.0034NA0.0190.0059NA0.100.0730.0140.045
BC4F8NANANANANANANANANANANANANANA
BC3F8NANANANANANANANANANANANANANA
BC5F80.00077NA0.0012NANANANA0.0043NANANANANANA
BCHF30.0600.0020NA0.049NANANA0.020NANA0.00110.0660.0039NA
BF2NANANANANANANANANA0.50NANANANA

Notes: NA = Not applicable; i.e., there are no applicable emission factor measurements for this gas. This does not necessarily imply that a particular gas is not used in or emitted from a particular process sub-type or process type.

[89 FR 31921, Apr. 25, 2024]
source: 74 FR 56374, Oct. 30, 2009, unless otherwise noted.