Code of Federal Regulations > Title 40 > Chapter I > Part 98 > Subpart I > Appendix - Table I-4 to Subpart I of Part 98—Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for 300 mm and 450 mm Wafer Size

Regulations last checked for updates: Nov 25, 2024

Title 40 - Protection of Environment last revised: Nov 21, 2024

Appendix - Table I-4 to Subpart I of Part 98—Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for 300 mm and 450 mm Wafer Size

Link to an amendment published at 89 FR 31921, Apr. 25, 2024.

Table I-4 to Subpart I of Part 98—Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for 300 mm and 450 mm Wafer Size

Process type/sub-type	Process gas i
Process type/sub-type	CF4	C2F6	CHF3	CH2F2	CH3F	C3F8	C4F8	NF3	SF6	C4F6	C5F8	C4F8O
Etching/Wafer Cleaning
1-Ui	0.65	0.80	0.42	0.21	0.33	0.30	0.18	0.15	0.32	0.15	0.10	NA
BCF4	NA	0.21	0.095	0.049	0.045	0.21	0.045	0.046	0.040	0.059	0.11	NA
BC2F6	0.079	NA	0.064	0.052	0.00087	0.18	0.031	0.045	0.044	0.074	0.083	NA
BC4F6	NA	NA	0.00010	NA	NA	NA	0.018	NA	NA	NA	NA	NA
BC4F8	0.00063	NA	0.00080	NA	NA	NA	NA	NA	NA	NA	NA	NA
BC3F8	NA	NA	NA	NA	NA	NA	NA	NA	NA	NA	0.00012	NA
BCHF3	0.011	NA	NA	0.050	0.0057	0.012	0.027	0.025	0.0037	0.019	0.0069	NA
BCH2F2	NA	NA	0.0036	NA	0.0023	NA	0.0015	0.00086	0.000029	0.000030	NA	NA
BCH3F	0.0080	NA	0.0080	0.0080	NA	0.00073	NA	0.0080	NA	NA	NA	NA
Chamber Cleaning
In situ plasma cleaning:
1-Ui	NA	NA	NA	NA	NA	NA	NA	0.23	NA	NA	NA	NA
BCF4	NA	NA	NA	NA	NA	NA	NA	0.037	NA	NA	NA	NA
BC2F6	NA	NA	NA	NA	NA	NA	NA	NA	NA	NA	NA	NA
BC3F8	NA	NA	NA	NA	NA	NA	NA	NA	NA	NA	NA	NA
Remote Plasma Cleaning:
1-Ui	NA	NA	NA	NA	NA	0.063	NA	0.017	NA	NA	NA	NA
BCF4	NA	NA	NA	NA	NA	NA	NA	0.075	NA	NA	NA	NA
BC2F6	NA	NA	NA	NA	NA	NA	NA	NA	NA	NA	NA	NA
BC3F8	NA	NA	NA	NA	NA	NA	NA	NA	NA	NA	NA	NA
In Situ Thermal Cleaning:
1-Ui	NA	NA	NA	NA	NA	NA	NA	0.28	NA	NA	NA	NA
BCF4	NA	NA	NA	NA	NA	NA	NA	0.010	NA	NA	NA	NA
BC2F6	NA	NA	NA	NA	NA	NA	NA	NA	NA	NA	NA	NA
BC3F8	NA	NA	NA	NA	NA	NA	NA	NA	NA	NA	NA	NA

Notes: NA = Not applicable; i.e., there are no applicable default emission factor measurements for this gas. This does not necessarily imply that a particular gas is not used in or emitted from a particular process sub-type or process type.

[81 FR 89256, Dec. 9, 2016]

authority: 42 U.S.C. 7401-7671q.

source: 74 FR 56374, Oct. 30, 2009, unless otherwise noted.